Used SVG / PERKIN ELMER / ASML 751 HT #293615179 for sale

SVG / PERKIN ELMER / ASML 751 HT is a Mask Aligner for cover layer and contact layer lithography. The machine uses ultra-high vacuum environment and exposure optics to achieve sub-micrometer accuracy, which is the minimum feature size the equipment can reproduce. The contact exposure time is adjustable from 2 to 200 ms, while the cover layer exposure time is adjustable from 5 to 500 ms. Additionally, the system has auto focus, stigmator, and auto exposure to ensure optimal alignment, exposure and focus during lithography process. SVG 751 HT aligner has a dual source unit for both cover layer and contact layer. It has a 300 mm chuck with slots for both cover and contact mask blank holders, and comes equipped with a 300 mm hatch holder capable of handling large volumes of substrates. The wafer is in contact with an accurate vacuum. This keeps the wafer from moving and ensures precise alignment when the exposure is made. The machine is equipped with quartz based projection optics which have maintained a high throughput, low noise, and low thermal obsolescence. In addition to the quartz optics, the machine also has a frame shutter machine with an adjustable speed, which provides the user with the control over the exposure times and power during lithography. The field flattening lens further helps in maintaining a flat field during the exposure process. ASML 751 HT has an automated process control tool which uses advances in electronic image processing and robotic control. This allows for precise alignment and repeatable exposure results. It also provides the user with flexibility in operation which provides with the ability to run different exposure processes without manual observation or correction. The machine also has an advanced substrate handling asset that uses load locks, wafer cages, and base vibration suppression to ensure a clean room environment and help prevent particle contamination. The optional in-line particle monitor features allows the user to monitor and control substrate contamination. The operational conditions of PERKIN ELMER 751 HT are monitored through a series of alarms and other readouts. These alarms allow the user to be immediately notified of any changes or issues that may affect the accuracy or integrity of the lithography process. This enables the user to address any issues quickly and minimize any potential damage. 751 HT is a highly accurate, cost-effective and reliable mask aligner designed specifically for use in the semiconductor industry. It provides users with the ability to produce lithography of the highest precision and accuracy while providing a safe and controlled work environment with minimal maintenance required.