Used SVG / PERKIN ELMER / ASML 761 HT #9265344 for sale

SVG / PERKIN ELMER / ASML 761 HT
ID: 9265344
Wafer Size: 6"
Vintage: 2003
Mask aligners, 6" 2003 vintage.
SVG / PERKIN ELMER / ASML 761 HT is a mask aligner used in photolithography for the fabrication of integrated circuits. The equipment features a short-wavelength deep ultra-violet (DUV) laser and a six-axes gantry designed to handle and align a wide variety of substrates and flexible masks. SVG 761 HT offers high alignment accuracy and precision over a large range of sizes and field of view and an array of automated features to facilitate fast and reliable experiments. ASML 761HT allows for the fabrication of integrated circuits with a minimum feature size of 0.3 microns in a wide variety of dimensions. It features a 6-axis gantry, where the 'X', 'Y' and 3 angular axes are used to precisely align the mask and substrate. ASML 761 HT also has a 19-micron spot laser that's used to align both the mask and substrate. The system also features a TTL removable lens that can be exchanged depending on the required feature size. The 4-position alignment table allows for fast and accurate setup of the substrate and mask. The unit's closed-loop servo electronics provide precise control and feedback to the gantry, allowing it to move with high accuracy and repeatability. Additionally, SVG / PERKIN ELMER / ASML 761HT can be used in vacuum or air, allowing for flexibility during setup and operation. SVG 761HT machine uses a LAM (Laser Alignment Marking) method, which is used to determine mask mold registration and substrate topography. LAM is composed of a line-by-line mask-written exposure followed by a secondary exposure comprised of a laser exposure which marks the substrate. The laser exposes the area that the mask isn't blocking - thereby providing more accurate alignment than traditional methods. 761HT also includes a high-resolution vision tool for macro alignment tasks. This asset uses a telecentric optics model and highly sensitive CCD camera detectors to ensure accuracy and precision. The equipment can detect and align up to 128 reference points, allowing for fast and reliable experiments. Moreover, PERKIN ELMER 761HT also includes several safety features. The system features light curtains for operator safety, and an automated cleaning unit to reduce dust and debris on the machining components. Additionally, the machine includes an automated end of run diagnostics feature to track performance and alert operators of any issues. 761 HT is an ideal tool for photolithography applications that require high precision and accuracy. It offers a wide range of features and functions to facilitate fast and reliable experiments.
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