Used SVG / PERKIN ELMER / ASML Micralign 640 #128871 for sale

SVG / PERKIN ELMER / ASML Micralign 640 is a sophisticated mask aligner equipped with advanced features that facilitate the precise and repeatable alignment of electron-beam lithography patterns onto a variety of substrates. This enables manufacturers to accurately fabricate circuit components at the sub-micron level, with unparalleled levels of accuracy and repeatability. The main component of SVG Micralign 640 is its high-resolution imaging equipment. This system combines an advanced optical microscope, equipped with both normal and trans-illumination capabilities, and a computer-controlled steering stage. The optical microscope provides a bright field image, which allows the user to accurately visualize the lithography pattern on the substrate. The steering stage is precisely aligned and adjusted against the substrate, controlling the relative positioning of the mask and the substrate with high precision. The unit is also equipped with an advanced light source unit, designed to ensure that the lithography pattern is accurately illuminated at all times. This machine includes a high-power UV light source, a power distribution network and a set of lenses and mirrors. The lenses and mirrors are strategically placed to maximize the uniformity of the illumination across the substrate. ASML Micralign 640 is also equipped with a set of precision-controlled positioning elements. These elements enable users to precisely adjust the position of the mask relative to the substrate. PERKIN ELMER Micralign 640 is also equipped with an advanced control tool, which allows users to program and store multiple lithography mask layouts. This makes it easy to quickly reposition the mask relative to the substrate, allowing for rapid modifications without any loss of accuracy. Micralign 640 is a powerful and precise tool designed to facilitate the efficient production and alignment of microcircuitry components. Its advanced imaging, light source, and positioning elements allow users to accurately and repeatably align lithography patterns onto various substrates, ensuring superior results and quality control.