Used SVG / PERKIN ELMER / ASML Micralign 651HT #9399549 for sale

SVG / PERKIN ELMER / ASML Micralign 651HT Mask Aligner is a fully automatic, computer-controlled device designed for photolithographic production of microelectronic devices. It is capable of aligning a variety of photolithography mask materials, ranging from thin-film masks to precision-etched masks. The equipment consists of a mask aligner head, a sample stage, a laser alignment system, and a light-emitting device, which project a laser beam onto the sample. SVG Micralign 651HT offers high resolution and high speed alignment of substrates. Its two-dimensional, two-axis alignment unit provides a maximum resolution of 4µm in the X and Y axes and ±2 arcseconds of tilt. It utilizes laser alignment with a pointer machine, an electron beam optical tool, and visible target optics, and has an alignment accuracy of +/- 2 microns or better. Furthermore, the 651HT offers high-speed alignment, with as little as 30 seconds required for patterning on a substrate. The Micralign utilizes virtual alignment libraries, which provide users with the capability to quickly move substrates and masks into the target position in both the X and Y axes. This process is coupled with near-field alignment, reducing the possibility of misalignment by recognizing positional errors and correcting them. The aligner is able to hold substrates up to 200mm in diameter, with a substrate thickness of up to 6mm. It is also capable of accommodating a wide range of masks, from thin-film masks to more complex, precision-etched masks. In addition, the 651HT supports both soft and hard contact alignment systems, meaning that masks can be aligned either on the edge of the substrate or against the flat surface. This asset is designed for high-throughput operation, and its pneumatically-controlled robotics enable quick shuttle times between parallel baselines. For convenience, the aligner is also compatible with industry standard software and databases, making it easier to connect multiple systems with centralized control. In summary, ASML Micralign 651HT is an excellent choice for fine-structure photolithography production of microelectronic devices. It offers high resolution, high speed alignment and is compatible with a wide range of masks. Its virtual alignment libraries reduce misalignment, while its pneumatically-controlled robotics provide an efficient, high-throughput model.