Used SVG / PERKIN ELMER / ASML Micralign 700 #293618523 for sale
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SVG / PERKIN ELMER / ASML Micralign 700 is a high-accuracy, high-precision mask aligner used in photolithography for precise VLSI wafer fabrication. SVG Micralign 700 features state-of-the-art galvanometric control and precise, repeatable registration for outstanding alignment accuracy. Designed for maximum productivity and flexibility, the equipment offers a broad range of function and capability to meet the exacting requirements of both production and research applications. This mask aligner is designed to be a precise, reliable, and fast tool for creating intricate patterns on a semiconductor wafer. The system's two-axis galvanometric scanning unit enables quick and accurate registration of up to 500 alignment markers. It can also accommodate up to five flex and flat masks at once. With its fast, precise, and repeatable registration, ASML Micralign 700 simplifies and accelerates masking operations. Micralign 700 is also equipped with an automated lens machine which quickly and accurately adjusts the optics for optimal alignment when moving from mask to mask. It also features a high-resolution imaging tool for inspecting alignments and identifying sub-micron misalignment as well as a high-precision laser interferometer for measuring and correcting small variances in the asset. The model features several key features that make it an excellent choice for semiconductor photolithography, including a high-speed crossline laser for precise alignment, an intuitive user interface that offers intuitive ease-of-use, and a mechanical equipment that provides optimal accuracy and repeatability. In summary, PERKIN ELMER Micralign 700 is a powerful, high-precision, and high-accuracy mask aligner designed to meet the exacting requirements of semiconductor wafer fabrication. It features a two-axis galvanometric scanner for rapid registration, a high-resolution imaging system for alignment inspection, and a high-precision laser interferometer for measuring and correcting small alignment variances. With its advanced features, it is an excellent choice for achieving fine alignment and circuit-level accuracy.
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