Used SVG / PERKIN ELMER / ASML PE661 / PE700 #9186519 for sale

SVG / PERKIN ELMER / ASML PE661 / PE700 Mask Aligner is a specialized, state-of-the-art stepper/aligner equipment designed for the production of photomasks and semiconductor wafers. The instrument has two optics systems, one for aligning photomasks on the wafer and the other for generating the diffraction pattern that will be seen by the photomask. The optics system is composed of a telecentric doublet objective, a dichroic beam splitter, and two angled mirror assemblies. SVG PE661 / PE700 features an extensive field of view (FOV) and a high degree of accuracy in alignment operations. The 800 × 800 μm FOV offers an accurate, real-time resolution of 5.4 μm, while the 1350 × 1400 μm FOV offers a resolution of 6.6 μm. The instrument performs pattern overlay measurements, process development, and wafer inspection operations with unparalleled precision. ASML PE661 / PE700 Mask Aligner is designed for high-yield production of semiconductor wafers. It features advanced optics, a die-to-die registration unit, an alignment stage, and patent pending multi-axis motion control hardware. The machine can optimize stitching for large area patterns, offering superior performance on critical alignment applications. It also offers stitching options for tiles, which provide even greater precision. PERKIN ELMER PE661 / PE700 offers an array of automated wafer handling capabilities, including a substrate clamp machine, a wafer handling unit, a wafer prealignment fixture, and a photoresist inspection tool. It also comes equipped with specialized wafer alignment and placement optimization systems which allow for more effective automated data collection and analysis. Additionally, PE661 / PE700 includes advanced calibration and tuning capabilities to ensure the highest accuracy over a wide range of process conditions. SVG / PERKIN ELMER / ASML PE661 / PE700 also features several unique and advanced safety features. The instrument is designed with vibration-damping mechanisms and cooling systems which prevent overheating and contamination of the chamber and optics. The machine also utilizes computer-controlled transmission dynamics which prevent undesired transient motion. Overall, SVG PE661 / PE700 Mask Aligner is a precision instrument designed to offer highly accurate alignment of photomasks on wafers in high-yield production settings. Its array of automated wafer handling components, advanced optics and layered safety features enhance its accuracy and reliability to ensure consistent, high-quality results.