Used SVG / PERKIN ELMER / ASML PE761 #9113601 for sale
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SVG / PERKIN ELMER / ASML PE761 is a high-precision maskaligner tool used to pattern semiconductor wafers and device layers at the nanometer scale. The mask aligner targets photolithography processes in the creation of semiconductor devices. For every lithography process, a 'mask' also known as a photomask is required. It contains patterns that are printed on to the wafers. The device layers must be placed in precise locations where they are then exposed and patterned. A key feature of SVG PE761 is its high positional and optical accuracy which is necessary for precise circuitry. Its 6-axis highly integrated automatic alignment system provides a high degree of flexibility and accuracy. It offers a motorised stage that can handle 4" or 6" wafer sizes as well as dual wafer alignment and a wide range of reticle sizes. ASML PE761 has an optical image system with both bright field and dark field capability, making it capable of facilitating different types of inspection including inspections of very small structures. PERKIN ELMER PE761 also features a wide range of automation and process control features. It is capable of automation of alignment, lithography and exposure processes and also incorporates automated SPC (Statistical Process Control) features, providing real-time process monitoring capabilities. In addition to the above, PE761 also offers a range of productivity features including high positioning resolution, fast wafer transfer and high repeatability and reliability. Alongside this, the machine is capable of handling a range of different processes as well as multiple intents. These include known-good-die printing and CMP (Chemical Mechanical Polishing) process control. The SVFSVG / PERKIN ELMER / ASML PE761 is an automated, precise, and highly integrated mask aligner tool. Its cutting-edge design and performance capabilities makes it an ideal choice for patterning semiconductor wafers or device layers at the nanometer scale. The combination of its 6-axis alignment system, due wafer alignment, and automated process control and monitoring features help make SVG PE761 an extremely useful tool for both photolithography and process control applications.
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