Used TAKATORI NMC 1 #9132183 for sale

TAKATORI NMC 1 is a mask aligner that is designed to accurately and precisely align microfabricated masks onto substrates. It is used to pattern high-resolution features on substrates such as Si wafers and is capable of positioning and aligning up to six independent masks simultaneously with accuracy and precision down to sub-micrometer level. NMC 1 utilizes advanced optical imaging and image processing techniques for alignment and positioning of the masks onto the substrates. The imaging equipment is composed of several optical components including a beam splitter, lens, CCD camera, and movable mirrors. The beam splitter splits the light from the alignment device into two paths. The first path is used to illuminate a reference pattern on the mask, while the second path is used to capture an image of an identical pattern on the substrate. TAKATORI NMC 1 is able to detect small alignment differences by analyzing the relative position of the captured images. It then automatically adjusts the motion of the mirrors and mask holder in order to precisely align the mask onto the substrate. The alignment accuracy of NMC 1 is approximately 50 nanometers. In order to maintain this level of accuracy, the system is equipped with an environmental control unit to ensure that temperature, humidity, and pressure levels remain stable during operation. TAKATORI NMC 1 is also designed to be used in conjunction with other devices such as a light source, a motion controller, and a vacuum chuck. The light source is used to illuminate the reference pattern on the mask, while the motion controller and vacuum chuck can be used to hold and move the mask and the substrate in order to ensure precise alignment. In addition to accurate and precise positioning of masks onto substrates, NMC 1 also provides some additional features such as mask registration and the ability to measure the distortion of mask patterns. It also has a manual mode for adjusting the alignment parameters manually. Overall, TAKATORI NMC 1 is an advanced mask aligner that offers precision and accuracy up to sub-micrometer level. It is designed to be used in combination with other devices such as light sources, motion controllers, and vacuum chucks in order to achieve precise alignment of microfabricated masks onto substrates. The environmental control machine ensures that temperature, humidity, and pressure levels are maintained stable during operation, while additional features such as mask registration and measurement of pattern distortion enable users to further optimize the results.