Used TAMARACK 162 #9397213 for sale

TAMARACK 162 is an advanced mask aligner used for producing high resolution photolithography patterning for the fabrication of integrated circuits with very high precision. 162 is a mask aligner that employs a continuous contact exposure process utilizing a moving laser spot. This type of mask aligner is significantly more accurate than traditional contact exposure systems, allowing for exposure resolutions of 2 microns or less. TAMARACK 162 is designed to deliver high resolution patterns with an exposure resolution of 0.5μm or less. This accuracy is achieved by an actuated x-y positioning system which enables precise alignment of components down to 0.1μm resolution, while utilizing a scanning laser focus to maintain high resolution imaging. 162 also utilizes a flexible patterning stage which permits varied pattern sizes and depths on a single substrate. TAMARACK 162 is a user-friendly mask aligner which allows for rapid and accurate production of complex photolithography patterns. It features an intuitive graphical user interface with touch-screen controls and an embedded motion control system for precise positioning. 162 also has internal automatic exposure monitoring and optimization, an auto-load system for wafer/substrate handling, and a self-managed robotic arm for loading and unloading masks. In addition to its high resolution imaging capabilities and user-friendly interface, TAMARACK 162 was designed with cost efficiency in mind. It features process automation and integrated productivity monitoring features to maximize throughput, and its flexible software can be used for a range of common device fabrication requirements, including spintronics, MEMS, microfluidics, and photonics, among other complex technology applications. Overall, 162 is an ideal choice for technologically demanding processes and applications requiring high precision photolithography patterning. Its high-resolution stage, robotics, and automated features allow for fast and precise photomask assembly and alignment, making it an ideal solution for high precision wafer fabrication.