Used TAMARACK 191 #9237954 for sale

TAMARACK 191 is an advanced mask aligner used for the processing and production of integrated circuits, where layers of photomasks with patterns for wiring, transistor and other patterns are transferred onto a wafer. 191 aligner uses an exposure equipment for its mask homogeneity. This system consists of a 157nm argon fluoride excimer laser light source, an imaging unit, a rotation stage, and an alignment machine. The exposure tool comprises an 157nm Wavelength Argon Fluoride excimer laser which is used to generate UV light that is used to expose photomasks to the wafer. The laser is an air-cooled, cold-cavity laser with a 6kW pulse power output, designed to produce even light intensity over the entire wafer. The imaging asset comprises a double multi-die lens with a numerical aperture of 0.50 and an auto-correlation algorithm which is used to compare patterns on the photomasks to underlying patterns on the wafer. The mid-sized rotation stage allows for the wafer to rotate 360 degrees for aligning the photomasks to the target patterns on the formed wafer. The stage is capable of highly accurate movement and can move in both the x- and y-axis with precision and repeatability. The alignment model is responsible for aligning or placing the photomask pattern with the underlying wafer pattern. It features an advanced affine-transform algorithm which assists in accurately placing each photomask layer on the wafer. TAMARACK 191 is an efficient and precise mask aligner ideal for high-volume production of integrated circuits. It features high laser intensity, imaging precision, and alignment accuracy, making it suitable for complex manufacturing processes involving a large volume of integrated circuits.