Used USHIO UX-4240 #9402607 for sale

USHIO UX-4240
Manufacturer
USHIO
Model
UX-4240
ID: 9402607
Aligners Part number: UX-4240SC-AFV01.
USHIO UX-4240 is a fully-automated Mask Aligner designed to provide high-accuracy mask and substrate alignment for optical lithography. This equipment is equipped with high-precision linear guides, dual motorized lead screw mechanisms, laser interferometers, and a multi-camera alignment system to ensure accurate and consistent substrate-to-mask alignment. USHIO UX 4240 Mask Aligner utilizes the built-in automation and computer interface that allows for easy and repeatable operation. The motorized lead screw mechanisms enable fast and exact motion control while the linear guides maintain the highest level of accuracy. This allows the unit to quickly and accurately repeatably position the substrate and mask without losing accuracy throughout the alignment process. The laser interferometers used in UX-4240 measure deflection during substrate movement and ensure that no displacement or misalignment occurs. The results are the highest in positioning accuracy of any existing Mask Aligner. In addition to its positioning accuracy, UX 4240 utilizes a multi-camera alignment machine. This tool features a pattern matching function to ensure accuracy at multiple points. It also features an intuitive user interface that simplifies setup and operation, enabling easier alignment of complex masks. The high-resolution LCD monitor incorporated into the asset also assists in aligning masks. USHIO UX-4240 Mask Aligner is also designed for rapid sequential alignment of multiple substrates and masks. This allows for larger batch sizes without compromising accuracy. The model has the ability to switch between substrates and masks in just a few seconds, enabling quick turnaround times during production. USHIO UX 4240 Mask Aligner is easy to maintain and operate, making it an ideal choice for optical lithography production processes. This cost-effective solution offers superior positioning accuracy, fast and easy setup, and improved throughput, making it an ideal solution for optical lithography production processes.
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