Used USHIO UX-4440 #293591994 for sale

USHIO UX-4440
Manufacturer
USHIO
Model
UX-4440
ID: 293591994
Wafer Size: 6"
Aligners, 6".
USHIO UX-4440 Mask Aligner is a dedicated, high-precision machine for photolithography patterning, allowing for mask and wafer alignment in sub-micron accuracy. It is designed for patterning and processing of substrates up to 4"x4", with a repeatability of ± 1 µm. The aligner supports photoresist optical lens systems, automated film deposition, and imported design data, making it effective for creating the precision alignment that is critical to developing highly refined wafers with intricate designs. The built-in advanced computer control equipment is capable of handling complex trace mode programs and auto-edge finder technology. USHIO UX 4440 has a 25mm to 200mm FOV, with a maximum optical magnification of 20x, allowing for a comprehensive view of the projected mask pattern, verifying the accuracy of alignment. Intuitive touch screen and a wide variety of features allow for ease of use (e.g. step-and-repeat, automatic mask registration). The user interface is programmable for up to 10 user-defined recipe settings and microscope images, allowing for the storage and playback of the process flow used for a job whenever desired. UX-4440 features a dual-chamber, non-toxic dry-etch resist remover that supports a variety of resist materials, enabling superior wafer quality. The system has a irradiation field of 430mm in length, allowing for uniform uniform exposure at the maximum speed of 200W/cm2. UX 4440's light source is customizable and can be used with both polarized light and UV light to accurately align the mask pattern. The built-in light source and gantry allow for a wide range of exposure angles, making narrow and wide-angle exposure on the same substrate possible. The microprocessor-based controller in USHIO UX-4440 allows for a range of operations such as auto process control, moveable batch processing, and low-temperature processing that make it an ideal choice for advanced wafer processing. In addition, the unit can be used for multiple layers wafer processing with the optional double-sided imaging machine, allowing for even more intricate processes to be carried out. USHIO UX 4440 Mask Aligner is an essential tool for semiconductor and display manufacturers that require fast, precise, and reliable lithography patterning. Its advanced features, as well as its highly accurate optical lens systems, make it the perfect choice for mask alignment and wafer processing of the highest quality.
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