Used USHIO UX-4440 #293636267 for sale
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USHIO UX-4440 is a state of the art mask aligner that offers industry leading high speed wafer alignment. It is capable of processing high alignment accuracy and high throughput at high throughput rates, while offering minimized line and mark alignment distortion. This makes it ideal for high volume production of semiconductor products. The core of USHIO UX 4440 mask aligner is its three-axis optical equipment. Utilizing two laser scanners and two laser diodes, it can measure both thickness and height of the etched pattern with a single scan. This ensures accurate alignment of the etched mask pattern on the wafer, enabling repeatable high-volume production. UX-4440 also has a visible light digital microscope providing high-resolution images with up to 0.2μm accuracy. In addition, with built-in self-calibration, the system can identify, measure, and align mark patterns and lines on the wafer. This makes adjustment and correction of alignment errors a breeze. The unit is equipped with a scanning stage, providing a wide view field (1mm square) with a maximum speed of 200mm/sec. It also has a wafer-holding stage that supports wafer diameter ranging between 3 and 8 inch. Automation of wafer loading, alignment and marking makes it easy to reproduce complex patterns accurately. UX 4440 is equipped with an optional interface board, enabling direct communication with various software programs, such as for quality inspection and statistics. This enables operations to be carried out automatically and thus reducing the potential for human error. In addition, USHIO UX-4440 comes with a full set of safety features, such as a wafer protector, alarm functions and standby mode in case of emergency. This ensures maximum safety and operator comfort with minimal risk of accidents. In conclusion, USHIO UX 4440 is a highly sophisticated mask aligner machine with advanced capabilities for high-volume production that can meet the demands of any industry. Its robust design, automation options and safety features make it the go-to choice for complex, high-precision alignment tasks.
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