Used ADE / KLA / TENCOR 351 #293605066 for sale

ADE / KLA / TENCOR 351 Mask & Wafer Inspection Equipment is a highly advanced optical inspection system used to examine wafers and masks for defects, contamination, or process variations. Developed by ADE, ADE 351 unit is a powerful tool for semiconductor manufacturers to ensure product quality and consistency of their microchip fabrication process. The machine utilizes a combination of advanced imaging, high-speed pattern recognition, and sophisticated defect-classification algorithms to analyze entire wafer areas or subfields of higher resolution, to identify any defects that might exist. It employs an automated, closed-loop tool to inspect patterns and images at high resolution, up to 20X1200 mag, over the entire surface of a wafer. Advanced image processing is used to detect particles, scratches, pattern discontinuities and other physical defects, as well as process variations. The wafer is then automatically scanned and the defects and patterns identified before they are presented to the operator. With automatic vision and pattern recognition capabilities, KLA 351 asset can inspect densely packed boards, minimize false positives, and optimize the throughput and yield. The automatic color selection ensures the highest levels of precision and accuracy for the most complex of masks. The model also supports mask-level verification and validation of all controlled parameters prior to shipping. For the highly sensitive needs of semiconductor manufacturers, TENCOR 351 equipment also supports an advanced contamination monitoring module to detect and immediately alert the operator to any outliers. This, in turn, helps identify possible contamination issues as soon as they are detected, ensuring that corrective measures can be taken in a timely manner. Additionally, the camera's resolution exceeds 1 micron resulting in unprecedented clarity. 351 system delivers a broad range of defect detection capabilities, including defect characterizations and defect size scans. The stepped, overhead scan architecture offers consistently high resolution images, which enable the quick identification of surface defects that would otherwise be difficult to detect. The built-in defect library allows the unit to quickly identify patterns of defects and flag them as they are found. ADE / KLA / TENCOR 351 Mask & Wafer Inspection Machine provides a versatile, robust and dependable tool for semiconductor manufacturers, offing assurance that their process produces the highest quality and yield without fail. Designed for high throughput and low cost, ADE 351 delivers exceptional quality data that can be used for process optimization and improved product yields.