Used ADE / KLA / TENCOR AWIS 3110 #293816349 for sale

ADE / KLA / TENCOR AWIS 3110
ID: 293816349
Wafer inspection system.
ADE / KLA / TENCOR AWIS 3110 is an automated mask and wafer inspection equipment designed for use in semiconductor manufacturing. It is capable of providing repeatable and reliable inspection of optical masks and wafers, enabling semiconductor manufacturers to quickly and reliably identify any potential defects in their fabrication processes. The system consists of a six-axis robotic arm, an underscanning optical unit, a 500mm stage for the substrate support, and a statistical sampling algorithm that enables evaluation of the underlying defects on the masks and wafers. The robotic arm is designed to provide fast inspection of multiple areas on the substrate, helping to ensure coverage of any area at risk of defect. The underscanning optical machine ensures that low-level defects can be detected, while the 500mm stage provides ample room for handling the substrates. The tool is also equipped with a variety of image data analysis algorithms. These algorithms can be used to automatically detect any relevant features on the masks and wafers, including those that are of sub-micron size. This asset is also capable of carrying a wide range of inspection algorithms, including edge detection for improved surface features detection, automatic line width measurements, and efficiency calculations for improved contrast detection. Finally, ADE AWIS 3110 also includes data management capabilities. This enables the user to store results from the inspection, enabling them to quickly and effectively review and compare results over multiple runs. This helps to improve the speed and accuracy of the inspection process. Overall, KLA AWIS 3110 is an effective and reliable model for mask and wafer inspection. It provides a comprehensive set of features, ranging from robotic arm movement and underscanning optical systems to image data analysis algorithms and data management capabilities. This ensures that users can quickly and precisely identify any underlying defects on their substrates, helping to improve efficiency and reliability in their semiconductor manufacturing processes.
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