Used ALLTEQ LFI 3010 #9278814 for sale

ALLTEQ LFI 3010 is a full-featured mask and wafer inspection equipment designed for maximum resolution and automated defect detection from current and future chip designs. It is capable of meeting the most stringent inspection requirements and provides an easy, integrated package for cost-effective defect coverage and detection. The optical portion of the system is designed with an advanced camera unit and contains an in-built laser source for high resolution imaging and inspection of both mask and wafer interfaces. It is equipped with an advanced software algorithm to ensure accurate and fast assessment of defects, with pre-defined criteria including size and shape detection. The mask and wafer interfaces are scanned in a "pointing motion" by the camera, which enables the machine to cover large areas within a short time. The data obtained is then analyzed and processed in real time, allowing for a quick and accurate assessment of defect or fault characteristics. Furthermore, it has a high visual inspection capability, providing a visual image of the defect for better understanding of the problem. With its high precision optics, efficient inspection algorithm and an extensive library of defect criteria, LFI 3010 ensures complete defect coverage and detection. Additionally, it has easy-to-use user interface and additional data extraction and analysis software tools, making it ideal for both large and small production facilities. This tool is compliant with modern semiconductor lithography and has been tested in laboratories and industrial production lines, proving its accuracy and reliability. It is highly effective at detect counterfeit components and is suitable for any type of applications. Finally, ALLTEQ LFI 3010 can be interfaced with other equipment such as production tracking systems or quality assurance systems, allowing for high end customer support and service to maximize customer satisfaction. This feature is especially useful for high efficiency production and automated defect analysis.