Used AMAT AERA II #293621241 for sale
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AMAT AERA II is a Mask & Wafer Inspection equipment designed to inspect masks, wafers and components used in semiconductor manufacturing operations. This system can be used to detect defects and reduce the cost of yield losses associated with printed structures on semiconductor wafers. AERA II allows mask and wafer images to be collected and analyzed for defects in order to optimize wafer yield and quality. AMAT AERA II is a high-accuracy sampling tool that samples and inspects hundreds of variations on the masks and wafers. The unit includes a variety of sensors and optics including digital cameras, stroboscopic cameras, spectroscopic sensors, laser interferometers, and digital image processing systems. It also has a sophisticated display machine and can view both flat and angled masks simultaneously, allowing for faster and more accurate inspection of mask patterns. AERA II can inspect all types of aberration with resolutions as high as 1.8 microns and sensitivity down to 0.2 micron. It has a top-down inspection capability with angles up to 85 degrees and can provide data to identify those areas most likely to have defects. The tool also has a wide range of optics, ranging from 5mm to 40mm in diameter, which gives the user a wide range of field of view and magnification. AMAT AERA II allows users to customize mask inspection settings to their particular application. This includes features such as mask pattern judgment, defect classification, binary analysis and pattern matching. The asset also has an automatic defect analysis model that can detect several types of defects such as over-exposure, under-exposure, dark spots, streaks and degradation. One of the key features of AERA II is its high-speed performance. It can inspect wafers and masks up to a rate of several hundred wafers per minute. This allows inspection results to be generated quickly and accurately, ensuring high yields and cost efficiency for semiconductor manufacturers. AMAT AERA II is an invaluable tool for the semiconductor industry. Its sophisticated sensors and optics allow it to identify defects quickly and accurately, and its customizable settings allow users to tailor the mask inspection process to their particular application. Its high-speed performance ensures that production costs can be minimized, and yields improved. In short, AERA II is an essential tool for any semiconductor manufacturer.
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