Used AMAT / APPLIED MATERIALS Complus 3T #9410557 for sale

AMAT / APPLIED MATERIALS Complus 3T is a versatile Mask & Wafer Inspection equipment. This system is designed to help manufacturers improve their production cycle and yield. The unit uses a unique combination of optics and automated inspection to detect pattern defects and wafer features. AMAT Complus 3T has a large field of view, with a 4 inch wafer stage allowing for full wafer inspection. The machine also has cutting-edge image processing and defect detection algorithms that provide fast, accurate results. The tool is also equipped with a laser interferometer for moving stage measurement and defect location accuracy. In addition, APPLIED MATERIALS Complus 3T has integrated automated defect review capabilities that can quickly locate and mark defect areas for further review. A comprehensive array of imaging techniques is available for various layers and substrate types to determine the morphological characteristics of defects. This allows for faster and more accurate defect review to help ensure better yield rates and improved production cycle time. Complus 3T can also measure particle and other surface contaminants on wafer and mask alike. The asset can detect contaminants at a variety of levels, from 5nm to 200 microns, to help manufacturers maintain a clean production environment. Furthermore, AMAT / APPLIED MATERIALS Complus 3T also features a wafer and product tracking model. This equipment tracks wafer and product information and results, to enable easy data retrieval. This makes AMAT Complus 3T an efficient system for manufacturing efficiency. Overall, APPLIED MATERIALS Complus 3T is a powerful and versatile tool for mask and wafer inspection. Its combination of latest-generation optics and imaging technologies, along with user-friendly design, make it an ideal choice for a variety of wafer processing and inspection applications. The integrated tracking and defect review capabilities also help manufacturers maintain high production cycle times and improve efficiency.