Used AMAT / APPLIED MATERIALS Complus 4T #9298594 for sale

AMAT / APPLIED MATERIALS Complus 4T
ID: 9298594
Vintage: 2010
Darkfield inspection system 2010 vintage.
AMAT / APPLIED MATERIALS Complus 4T Mask and Wafer Inspection Equipment is a versatile and compact system that efficiently combines the tasks of mask and wafer inspection. This unit is specifically tailored to the needs of the semiconductor industry, providing high throughput and cost efficiency along with unmatched image resolution. It offers a suite of integrated technologies for both mask and wafer inspection, as well as for review and data analysis. AMAT Complus 4T offers advanced mask inspection capabilities, including resolution enhancement technology (RET) and optical scatterometry (OS). RET is a technology used to measure the effects of diffraction on mask patterns, while OS measures the distortion of secondary electrons caused by features in a mask pattern. Combined, these two technologies allow APPLIED MATERIALS Complus 4T to achieve high levels of opacity and sharpness in mask images by providing a level of detail that surpasses competing inspection systems. For wafer inspection, Complus 4T offers a range of innovative tools, including projected field inspection (PFI) and color image analysis (CIA). PFI is a low-cost, fast-turnaround way of inspecting compliant photomask features. It provides detailed measurements of a wide range of features and uses multiple algorithms to compare images from multiple fields. CIA combines optical scatterometry (OS) with digital imaging processing (DIP) to enable high-resolution imaging of any pattern on a wafer. It also allows for the detection of optical contaminants, enabling reliable detection of particles or particles for high-yielding production. AMAT / APPLIED MATERIALS Complus 4T also provides reliable review tools, including the automated pattern detection (APD) module. The APD module automatically detects critical defects on mask and wafer images and provides high-precision measurements. It is especially useful for detecting features that current inspection methods may miss, such as line-end breaks and edges that are difficult to characterize. Finally, the machine also comes with comprehensive software for data analysis and reporting. This includes an integrated export facility that allows customers to send reports to other systems or to other mail clients. In summary, AMAT Complus 4T Mask and Wafer Inspection Tool provides unmatched image resolution and a suite of integrated technologies for both mask and wafer inspection, as well as for review and data analysis. This asset ensures that customer's manufacturing processes comply with regulatory standards with an unprecedented level of detail and accuracy, making it an essential tool for cost-effective semiconductor production.
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