Used AMAT / APPLIED MATERIALS Excite #9072231 for sale

AMAT / APPLIED MATERIALS Excite is a comprehensive mask and wafer inspection equipment, designed to provide superior image fidelity, 3D metrology and defect isolation for next-generation semiconductor manufacturing. The system is equipped with advanced optics, sensors and digital imaging libraries, enabling it to quickly and accurately detect surface and subsurface defects. It offers advanced stereo color imaging on wafers up to eight inches in size and up to three inches thick. Its automated defect characterization capabilities and onboard microscope further improve the accuracy of its defect detections. The unit features three imaging modes and two illumination systems, providing different results depending on sample features and the desired outcome. Its bright-field unit is great for examining patterns, while its dark-field output is ideal for examining surface and subsurface defects. Its UV fluorescent output allows it to identify contaminants and particles, while its surface relief imaging capability enables it to take three-dimensional views of wafers and masks. In addition, AMAT Excite utilizes advanced software for defect classification, helping to further improve its accuracy and reporting accuracy. The software is capable of automatically recognizing defect classes, allowing for easier analysis of results. It also includes specialized image analysis modules, allowing users to isolate and view selected defects against either the full-field or focal planes. Finally, the machine includes a host of image visualization capabilities and powerful support platforms. These support platforms enable users to quickly and easily share images across departments, as well as to swiftly retrieve results for comparison and defect analysis. Overall, APPLIED MATERIALS Excite is one of the most advanced mask and wafer inspection systems on the market today. Its superior optics, imaging capabilities and advanced software ensure that customers are able to quickly, accurately and reliably detect and isolate defects on surfaces and substrates.