Used AMAT / APPLIED MATERIALS / ORBOT WF 736 DUO #293730901 for sale

AMAT / APPLIED MATERIALS / ORBOT WF 736 DUO is an automated mask and wafer inspection equipment designed for masks, wafers, and substrates used in semiconductor manufacturing. This system utilizes up to 256 gray level resolution and provides imaging accuracy for both optical and electrical inspection of advanced photomask layers used in Fabrication, Mask-Writing, FPD and LCD Mask production. AMAT WF 736 DUO comes with both a brightfield and a darkfield quad channel inspection unit, providing dual sided inspection capabilities and advanced defect detection, without compromising throughput or productivity. The machine contains a patterned mask handler to rapidly transfer high resolution ORBOT WF 736 DUO images. The integration of mechanical and optical systems provide a seamless transfer of mask images with high pattern accuracy. Additionally, WF 736 DUO has integrated CMOS sensor for imaging large format masks and wafers up to 300mm, with the latest optics imaging technology that provides ultra-high resolution. With the use of built-in facilities such as Auto Focus, Focus Resolution Grouping, Auto Focus Control and GUT observation, APPLIED MATERIALS WF 736 DUO can detect defects such as particles, scratches, line breaks and pin-holes which are difficult to detect with traditional inspection systems. The tool also contains MRC Focus Control, a unique technology developed by AMAT which enables accurate imaging of highly complex patterns. The asset is also designed with flexibility in mind, making it the ideal inspection equipment for both prototyping and product engineering. In addition to providing excellent accuracy and precision in defect detection, AMAT / APPLIED MATERIALS / ORBOT WF 736 DUO also provides a clear and economical solution for mask inspection. It is easy to setup and inspect, and provides the flexibility to accommodate many different types of masks and wafers. For automated inspection, AMAT WF 736 DUO comes with feature recognition technology, which enables engineers to specify the precise pattern locations to be inspected. This strengthens the inspection procedure, minimizes false positives and false negatives, and provides more confidence in defect detection accuracy. The model also features fully automated defect capture package, which allows engineers to view the defect image on the screen in real-time and perform detailed analysis. ORBOT WF 736 DUO equipment offers an efficient and cost-effective solution to mask and wafer inspection, providing fast inspection times and superior image clarity. With its advanced pattern recognition technology and defect detection capability, WF 736 DUO system is well suited to meet present and future requirements for accurate and reliable mask and wafer inspection.