Used AMAT / APPLIED MATERIALS / ORBOT WF 736 XS #293610298 for sale

AMAT / APPLIED MATERIALS / ORBOT WF 736 XS
ID: 293610298
Patterned wafer inspection systems.
AMAT/Orbotech AMAT / APPLIED MATERIALS / ORBOT WF 736 XS is a mask and wafer inspection equipment designed to provide precise, rapid analysis of complex microstructures. This system combines advanced optical and image processing technologies to deliver high-performance, high-precision inspection. AMAT WF 736 XS unit uses a high-end imaging machine with a 512 x 512 pixel resolution and digital zoom capabilities to capture crisp, high resolution images of masks and wafers. This tool also integrates a high-speed motion stage with motion controllers and precise encoders for precise navigation and positioning of the wafer or mask during inspection. ORBOT WF 736XS asset provides automated inspection capabilities, enabling users to quickly identify defects and make corrective actions. The advanced image recognition algorithms can identify and classify defects and anomalies including particle contamination, pattern misalignments, misregistrations, critical dimension errors and bridging. Additionally, this model supports a range of image processing tools, such as contrast and sharpening, false color interpretation, edge enhancement, 3D imaging and more. This equipment is capable of analyzing both conventional single mask designs and more intricate multi-mask design. Additionally, WF 736 XS features a built-in process-sensitive defect exclusion to help reduce false positives and false negatives. Furthermore, AMAT WF 736XS is designed for ease of use, featuring an intuitive graphical user interface that guides users through the inspection process. This system also comes equipped with many intuitive features, such as a simple defect location or automatic pass/fail determination.G APPLIED MATERIALS WF 736 XS is designed for use in demanding production environments, providing comprehensive automated mask and wafer inspection capabilities. This unit is capable of inspecting both single and multi-mask designs, and its advanced optical technologies, image processing capabilities and intuitive user interface makes it perfectly suited for a range of industries and applications, including semiconductor fabrication and MEMS device production.
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