Used AMAT / APPLIED MATERIALS SemVision CX #9218625 for sale

AMAT / APPLIED MATERIALS SemVision CX Mask & Wafer Inspection Equipment is a comprehensive and user-friendly solution for a broad range of mask and wafer inspection needs. The system provides high-performance pattern recognition and defect localisation capabilities, supporting the latest photomask and IC technologies, as well as a wide range of process flows. It features a robust optical design for superior image analysis, sensitivity and resolution capabilities. AMAT SemVision CX includes an advanced image-capture unit that captures full-field images of mask and wafer layers in both single-field and multi-field imaging modes. It offers automated defect detection capabilities that effectively identify a wide range of mask and wafer defects such as CDs, line-edge roughness, line-width variations, bridging, contact holes, etch shrinks and more. The machine is also able to detect different types of defects in varying environments, such as through field-of-view (FOV), registration, and multiplexing applications. APPLIED MATERIALS SEM VISION CX also includes powerful defect analysis capabilities, allowing users to quickly identify, classify, visualise and understand the associated defects. It also provides quantitative data analysis allowing for easy defect comparison and sorting, as well as advanced defect prioritisation tools. APPLIED MATERIALS SemVision CX is designed for maximum efficiency due to its fast vacuum nozzle handling, sample positioning, automated defect isolation and review capabilities. It also facilitates traceability and data storage needs by providing user-defined template storage and creates reports quickly and accurately. AMAT SEM VISION CX is built for maximum productivity, with an integrated, easy-to-use software suite for image analysis, data collation, reporting and generation of yield parameters as well as data transfer and integration with other systems in the factory. Overall, AMAT / APPLIED MATERIALS SEM VISION CX is an advanced mask and wafer inspection tool that offers unparalleled imaging and defect analysis capabilities, giving users the ability to detect and analyse a wide range of mask and wafer defects at unprecedented resolutions.