Used AMAT / APPLIED MATERIALS SemVision G3 Lite #9280960 for sale
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ID: 9280960
Defect review system, 12"
Specifications:
± 0.05 mm (SEMI M28)
775 ± 25 um
Notched wafers
Carrier: (2) FOUPs 25wf, 12"
Interface: (2) FOUP (Continuous flow operation)
Supporting remote units
EBARA ES80 Dry and vacuum pumps
EPDU
UPS: 3 Phase, 208 V, 60 Hz
Vacuum block assembly
Fixed system configuration:
Wafer ID reader: Backside bar code wafer scribe reader
P I/O For OHT (Hokuyo): VERITYSEM AUTO5
Operator access switch: VERITYSEM AUTO8
Wafer mapping capable: Through beam mapper VERITYSEM-AUTO6
Optical FOV: Large optical FOV 100x um 20x and 2.5x
Communications protocol: SECS-II GEM+
HSMS 300 mm as VERITYSEM AUTO10, E84,E87,E90,E94 (TAR1.5)
Tilt capability: Tilt function NA
Contact hole profile grade: SECS capable output VERITYSEM-SYS2
Wafer stage: Anorad stage
Data back up: Monthly PM backup
EMO: One per side of main body and one on operator console
Interlocks: ETU Access panel
Signal tower:
Red / Yellow / Green / Blue:
Upper left of front and upper right section of loader on maintenance side
Installation requirements: CDA Bulk gas
(l/min) per SEMVision SSPS:
CDA Peak flow: 120
Ave flow: 16
LPOCs Req: 4
Electric supply: 120 V, Single phase, Peak flow: 1, 120 V
Water: (l/min) per SEMVision SSPS
PCW Peak flow: 75
Exclusive to G3
Stage: Z25 Oil, stage acceleration 1/4g, clean cables
Scan electronics: MEC
Computer: IP and WHC and MEC and EDX Computer
Power supply: HVPS, CDM
SEM Column: Column version NA
OM: DF/BD
Dry pumps not included
CE Marked
2007 vintage.
AMAT / APPLIED MATERIALS SemVision G3 Lite is a mask & wafer inspection equipment that is designed to perform precise measurements on substrates and circuit patterns. The system is built on an open, modular platform that allows for easy integration with existing test and metrology systems. It is equipped with high-resolution imaging tools to acquire precise images of patterned structures, including critical layers, at high enough resolution to enable precise measurements. The unit features a high-speed image acquisition technology, which allows for the analysis of large surface area in a short amount of time. It also incorporates sophisticated image processing algorithms to enhance images, detect defects, and enable more precise measurements of dimensions and shapes. The machine comes with a powerful suite of software tools for analyzing the acquired images. These tools allow for the comparison of measurements with reference data, and for the validation of specific criteria used to identify design flaws or defects. The tool is also equipped with a range of measurement capabilities that enable accurate and high-resolution measurements of various parameters, including line width, minimum width, overhang, linearity, edge roughness, contact width, etching depth, diameter, and taper angle. Additionally, both transmission and reflection imaging capabilities are incorporated to facilitate accurate comparison of absolute dimensions and dimensions between multiple layers of a substrate. The asset is also compliant with industry standards, such as the SEMI M13 standard, allowing it to be compatible with existing metrology tools. Additionally, it features a user-friendly interface, allowing users to quickly and efficiently set up and use the model. All the features and capabilities of the equipment can be controlled via a web-based user interface. AMAT SemVision G3 Lite is an ideal solution for mask & wafer inspection, providing users with efficient and comprehensive test coverage of substrates and patterns. The system is designed with the latest optical and imaging technologies and leverages robust image processing capabilities to ensure superior image quality and accuracy. Its user-friendly interface and customizable measurement routines make it an ideal choice for a variety of applications, allowing users to save time while maintaining throughput and product quality.
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