Used AMAT / APPLIED MATERIALS SemVision G3 #9274013 for sale

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AMAT / APPLIED MATERIALS SemVision G3
Sold
ID: 9274013
Wafer Size: 12"
Vintage: 2011
Defect review system, 12" 2011 vintage.
AMAT / APPLIED MATERIALS SemVision G3 is a Mask & Wafer Inspection Equipment that provides the highest optical performance and image quality, allowing for the most accurate placement and alignment of masks and wafers. The system can be used for a variety of applications, including defect detection, overlay measurement, and 3D profilometry. AMAT SemVision G3 is designed to provide superior imaging and inspection capabilities to the semiconductor industry. It uses advanced imaging technologies and an automated algorithm to provide accurate defect detection, overlay measurement, and 3D profilometry capabilities. The unit utilizes three independent imaging systems which, when combined, offer an unsurpassed level of performance. These systems include the near-visible imaging machine (NIS), Electron Beam writing tool (EBS), and the combined Wafer and mask Inspection Asset (WMIS). The NIS offers an optical resolution to characterize nanometer-sized features over a large field of view. It also has the capability to detect and measure very small micro-defects or structures. The combination of the NIS and EBS systems allows for the highest possible accuracy in critical alignment measurements. The WMIS is a combined wafer and mask inspection model, which makes use of advanced imaging technologies and algorithms to provide precise defect detection and overlap measurement capabilities. The equipment takes advantage of two-dimensional (2D) video imaging, and a 3D scanning technique that allows the user to precisely analyze and measure both the wafer and the mask. APPLIED MATERIALS SemVision G3 also features a range of other features, such as automated calibration and operation, 16-bit resolution imaging, an embedded Metrology 3D Laser Confocal Microscope (LCM), and an integrated software-controlled measurement and analysis system. SemVision G3 is the ideal solution for rapid and accurate mask and wafer inspection and characterization, enabling semiconductor professionals to deliver high-quality products and services. Its wide range of features and advanced imaging and analysis capabilities make it an ideal choice for any semiconductor application.
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