Used AMAT / APPLIED MATERIALS SemVision G5 #293614938 for sale

AMAT / APPLIED MATERIALS SemVision G5
ID: 293614938
Wafer Size: 12"
Vintage: 2012
Defect review system, 12 2012 vintage.
AMAT / APPLIED MATERIALS SemVision G5 from AMAT is a next generation mask and wafer inspection equipment designed to provide advanced imaging of semiconductor wafers during the fabrication process. It features an optimized optical system, a 5-axis motorized stage, and a high-resolution CCD camera to ensure optimal imaging conditions. AMAT SemVision G5 provides reliable, high-resolution imaging and analysis of patterns found on patterned structures and devices on semiconductor chips. The optical unit features a multi-polarized energy reflectron at its core, which enables improved detection of sharp edges, small defects, and fine line defects. It also includes an ultra-high degree of focus accuracy, a low-noise CMOS camera, and a visible alignment machine. In addition, APPLIED MATERIALS SemVision G5 has an integrated autofocus tool, enabling it to automatically adjust focus and image size based on the wafer's topography. The imaging capabilities of SemVision G5 are further enhanced by its integrated stage. This 5-axis motorized stage provides precision movement in the X, Y, Z, pitch, and roll coordinates, allowing for 360-degree imaging of the wafer. Moreover, it enables the asset to quickly move between multiple points, allowing for maximum coverage and faster throughput. Furthermore, AMAT / APPLIED MATERIALS SemVision G5 utilizes a state-of-the-art CCD camera with a resolution of 5 μm, enabling it to easily detect and analyze small feature sizes of up to 5- 6 μm. Additionally, it features advanced image quality metrics such as image noise, contrast, and edge sharpness, which ensure reliable imaging results. In conclusion, AMAT SemVision G5 is an advanced mask and wafer inspection model with a high-performance optical equipment, 5-axis motorized stage, and CCD camera. Its excellent imaging capabilities enable it to detect small features, defects, and line patterns on semiconductor wafers, allowing for reliable and accurate analysis and fabrication processes.
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