Used AMAT / APPLIED MATERIALS SemVision G5 #9194738 for sale

AMAT / APPLIED MATERIALS SemVision G5 is an advanced mask and wafer inspection equipment, designed to optimize defect detection and manufacturer process optimization. Its sophisticated, automated image capture and analysis technology enables it to detect microscopic defects and features on semiconductor wafers and masks that might otherwise go undetected. The G5 is designed with a fully automated system for precise imaging and inspection of wafer and mask surfaces. Its advanced imaging unit is capable of capturing and analyzing images at resolutions down to 0.04 microns. The machine is capable of simultaneously detecting design rule and process defects/features, making it ideal for a wide range of applications, from process control to fault isolation. The tool is equipped with a suite of comprehensive hardware and software components that allow automated image capture and analysis. Its advanced Optical Detection Tunnel (ODT) allows for fast, accurate image capture and analysis of wafer and mask surfaces. The ODT also features an image capture optical column that can be configured to capture images in either a top-down or side-view orientation, depending on the application. The asset's high-speed, high-accuracy imaging sensors ensure precise image analysis. The G5 also features a number of software components. It includes a Scoring comparison engine that allows for rapid and reliable comparison of images, as well as a Defocus Correction Module (DCM) that can make corrections to blurriness in captured images. The model also includes a Comprehensive Pattern Matching (CPM) tool, which allows for the comparison of images in an automated fashion. The G5 also has an advanced user interface. The equipment's intuitive graphical user interface allows for easy navigation and simple data input, as well as clear reporting. The interface is highly configurable, allowing for customization of the image capture, analysis and evaluation process. AMAT SemVision G5 system is designed for performance, efficiency and reliability. Its advanced image capture and analysis unit enable fast detection and corrections of microscopic defects and features. Its intuitive GUI provides ease-of-use for operators, and its integrated software tools provide an efficient workflow and complete analysis of defects and features. This powerful machine is an ideal solution for optimizing process control and performing precise mask and wafer inspections.