Used AMAT / APPLIED MATERIALS UVision 4 #293585584 for sale

AMAT / APPLIED MATERIALS UVision 4 is a mask and wafer inspection equipment that provides exceptional performance in defect detection, sizing and signal/noise discrimination of microscopic defects. This system offers improved throughput, signal-to-noise detection ratios and defect resolution. Additionally, it offers precision measurements and automated defect report generation. The unit is based on an open architecture platform, which incorporates several key components. A large image plane detector is used to ensure highly accurate detection and measurement of defects within the processed wafer or mask. It features a dual-scan imaging machine, combining both transmission and reflected-light imaging techniques to provide consistent, reliable defect signals with a low false alarm rate. This inspects micro-defects with normal light, enabling the detection of microscopic deformities with minimal effect on the background environment. The imaging tool also includes an advanced illumation asset, which includes UV, visible and infrared light sources to properly reveal the characteristics of a defect. This allows for accurate size and location estimations. Additionally, the model offers an optimized focus stage for better defect resolution using through-focus scanning. The equipment also offers an Instrument Control Software to provide users a comprehensive means to control system functions and analysis. This software allows them to set up and optimize the unit's detection capabilities and status monitoring. Additionally, the machine offers an extensive range of analysis tools, such as measurement tools and a fully automatic defect review tool, as well as a feature extraction and defect classification asset. These features make AMAT UVision 4 a powerful tool for mask and wafer inspection. By providing accurate measurements and defect report generation, it ensures consistent quality ensuring defects are detected before they enter production. It also offers superior imaging capabilities and various analysis tools, which allows operators to easily monitor and manage the mask and wafer inspection process. In short, it offers a reliable and versatile model for defect detection within mask and wafers, making it a superior tool for the semiconductor industry.