Used AMAT / APPLIED MATERIALS UVision 4 #293665699 for sale

AMAT / APPLIED MATERIALS UVision 4 is a high-precision, five-axis mask and wafer inspection equipment designed for semiconductor fabrication applications. It is capable of measuring pattern geometric, size and shape characteristics as well as surface errors on both wafers and masks. The system incorporates a series of three-dimensional optical sensors to detect both on-view and in-depth defects. AMAT UVision 4 is equipped with an advanced image-processing algorithm that compares and analyzes the geometry of patterned features, which helps in the early detection and prevention of errors. The unit utilizes an 8-inch by 8-inch dual stage that accommodates 200-mm and 150-mm wafers. APPLIED MATERIALS UVision 4 is equipped with two class-two bright field luminaires that enable easy identification of small defects and features. In addition, its active staging technology allows precise scanning of both full and partial surfaces. This ensures that potential defects are spotted early on, allowing for better wafer and mask yield. To ensure accuracy and reliable results, the machine is equipped with a built-in automated feature extraction software. This software automatically extracts and examines features such as bridges, trenches and fiducial marks to determine their dimensions and locations. The automated software is also capable of analyzing edges, line-end shapes and openings/closings. It is also equipped with anti-aliasing and jittering algorithms that help improve resolution and contrast. UVision 4 is designed to be used with a variety of digital imaging technologies such as scanning electron microscope (SEM), transmission electron microscope (TEM) and laser imaging. It also utilizes different illumination and exposure technologies such as spot illumination, flood illumination and pulsed illumination. The tool is also able to detect complex features using advanced feature recognition and pattern matching algorithms. This multifunctional asset helps to drastically reduce the time and effort needed for the inspection of wafers and masks during semiconductor fabrication. It offers increased throughput and stable performance while providing higher precision and accuracy for detecting and measuring defects at the nanometer level. AMAT / APPLIED MATERIALS UVision 4 can also help boost yield through the comprehensive identification of defects and verification of design rules.