Used AMAT / APPLIED MATERIALS UVision 4 #9222757 for sale

AMAT / APPLIED MATERIALS UVision 4 Equipment is a powerful, automated, high-throughput mask and wafer inspection system utilized primarily in the semiconductor fabrication process. The unit is designed to quickly and accurately detect any manufacturing defects in the exposed wafer that could potentially result in performance issues in the manufactured device. AMAT UVision 4 operates by a series of automated processes and advanced algorithms. The series begins with incident light, such as UVLED or laser light, being directed onto a wafer on the sample stage. The incident light bounces off the wafer surface and is analyzed to detect any aberrations or deviations in the expected pattern of the surface. Reflective images are then captured and digitized. This digitized information is then compared against a library of expected data that has been loaded into APPLIED MATERIALS UVision 4 machine. Any irregularities will be detected, and an electronic signal is then sent, highlighting any discrepancies on a visual display. The data collected by UVision 4 is then used to generate a report that can be analyzed. The detail and accuracy of the report is unrivaled in this industry. The report contains a comparison between the expected and actual surface shapes, analysis of non-uniformities in the resist film patterns, and evaluation of line edge roughness. The speed and accuracy of AMAT / APPLIED MATERIALS UVision 4 allows for quick and reliable evaluation of masks and wafers during the fabrication process. It eliminates the need for manual inspection and can detect manufacturing defects that would otherwise go undetected by other manual solutions. AMAT UVision 4 tool is also highly customizable. It has the ability to detect a wide range of wavelengths and scan various substrates such as aluminum, copper, and quartz. Additionally, users can modify or delete existing inspection algorithms and create custom ones to suit their specific application. The asset is also equipped with a high-resolution CCD camera and beam source selectable detectors for estimating line edge roughness. Additionally, it has the capability to facilitate multi-site analysis of wafers simultaneously. This ensures that the data collected is representative and accurate. All in all, APPLIED MATERIALS UVision 4 Model is an advanced and powerful mask and wafer inspection equipment that allows for a comprehensive evaluation of masks and wafers during the semiconductor fabrication process. As a result, any manufacturing defects can be detected quickly and accurately, leading to an improved yield and reduced costs.