Used AMAT / APPLIED MATERIALS UVision 7 #293589573 for sale

AMAT / APPLIED MATERIALS UVision 7
ID: 293589573
Vintage: 2008
Brightfield inspection system 2008 vintage.
AMAT / APPLIED MATERIALS UVision 7 is a mask and wafer inspection equipment for advanced semiconductor lithography applications. A key feature of the system is its low-preemptive scanning, allowing it to quickly and accurately identify defects, reducing the need for costly retooling and reworking. AMAT UVision 7 achieves its superior performance by combining several advanced optical and imaging technologies. The unit utilizes a Sony CCD 2048x2048 physical pixel array with a 256x256 virtual pixel array. The integrated CoolSNAP WS Global shutter and corona discharge illumination provides superior defect sensitivity. High-definition, high-resolution image capture is achieved with a high numerical aperture, improved depth of focus and increased dynamic range. Its 10-bit color depth further enables it to isolate and resolve extremely small and subtle defects with pin-point accuracy. APPLIED MATERIALS UVision 7 is designed with a durable, robust architecture. Its lightweight, fiber-optic encasement ensures exceptional protection from environmental and electrical interference, making it suitable for harsh industrial or clean-room conditions. Its modular alignment machine and automated wafer handling further reduce the time and effort it takes to prepare to inspect a wafer for defects. UVision 7 is also backed by powerful software, which can be customized to the user's needs and preferences. The VirtualLights Simulators provide a powerful simulation environment to explore the tool's optical performance. Further, the VisionDesigner Pro package offers a wide variety of image processing tools, allowing for optimal defect recognition and analysis. This can be used to evaluate alternative strategies for defect analysis, as well as to change the asset's operating parameters. In summary, AMAT / APPLIED MATERIALS UVision 7 is an advanced mask and wafer inspection model, suitable for a variety of lithography applications. Its low-preemptive scanning and powerful imaging technologies ensure superior performance and defect identification, while its robust architecture and modular design make it an excellent choice for challenging industrial or cleanroom environments. With its specialized software packages, the equipment provides users with a wealth of options for fine-tuning its performance to deliver the most accurate and reliable results.
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