Used AMAT / APPLIED MATERIALS UVision 7 #9271006 for sale

AMAT / APPLIED MATERIALS UVision 7 is a mask and wafer inspection equipment used to identify defects on wafers and photomasks. It direct pattern defects, monitor process, increase collaboration, ensure defect classification accuracy and increase throughput to reduce complexity and increase yields. AMAT UVision 7 utilizes a charged particle beam optical system to obtain imaging and probe data from a substrate. This technique utilizes photoelectron lens, a photoelectron accelerator, and a photoelectron detector. These components reference an electron and produce a high-resolution image without deforming the surface of the mask or wafer. This image is then examined at high magnification to pinpoint potential defects. APPLIED MATERIALS UVision 7 incorporates a direct-cathode illumination unit for wafer defect identification. This machine utilizes a fluorescent screen to enhance the viewing of surface features. Bright spots on the screen indicate imperfections in the surface level or structure. UVision 7 also features a full-field imaging tool that analyzes an entire wafer surface at the same time. This enables a comprehensive view of any defects or structural weaknesses that may exist and can quickly identify any areas that need additional attention. To increase collaboration between the user and customer or supplier AMAT / APPLIED MATERIALS UVision 7 incorporates both remote review capabilities as well as decision support tools. The remote review capability allows for defect review and collaboration from facilities around the world. The decision support tool aids in automated defect classification to reduce complexity and operator workload. Additionally, AMAT UVision 7 includes the patent-pending Active Pattern Learning capability. This feature continuously monitors the changing pattern of the surface over time and can rapidly identify new or changing patterns to help prevent latent defects. Overall, APPLIED MATERIALS UVision 7 is an advanced mask and wafer inspection asset that provides imaging and probing capabilities, direct-cathode illumination for wafer defect identification, full-field imaging to analyze entire surfaces at once, remote review capabilities to increase collaboration and decision support tools to reduce complexity. The patent-pending Active Pattern Learning capability helps identify new or changing patterns to prevent latent defects. This model, in conjunction with its various features, increases yields and reduces complexity to ensure high-quality production of photomasks and wafers.