Used AMAT / APPLIED MATERIALS WF 736 DUO #9410324 for sale
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AMAT / APPLIED MATERIALS WF 736 DUO is a comprehensive mask and wafer inspection equipment designed to deliver high-resolution results with up to 28nm pattern resolution and 2-micron critical dimension measurements. The system is based on advanced pattern processing, measurement and imaging technology, including optical scanning and analytical technologies like direct electron imaging and spectroscopy. The unit can quickly analyze entire wafers and masks while maintaining precise measurements and results. AMAT WF 736 DUO is suitable for many wafer and mask inspection tasks, from defect detections to device characterizations. The machine utilizes advanced scanning, imaging, and measurement technologies. Its direct electron imaging technology provides an unprecedented level of detail for analyzing samples, and its laser-vector scan technology enables quick and accurate mapping of samples. It is a comprehensive package and can perform two-dimensional and three-dimensional inspection of mask and wafer samples. Additional features such as electron-beam image registration and correction, and deposition measurement by lithography allow the tool to acquire even the most demanding and extensive data sets. The asset also offers integrated software that further simplifies the data analysis process. This software allows users to quickly analyze and characterize samples while creating output reports to review results. It can also be used to plan and automate scanning operations with user-defined data sets. APPLIED MATERIALS WF 736 DUO also features an intuitive user interface and real-time operator control. Its user-friendly controls enable users to interact with their samples in fewer steps, increasing the efficiency of operations. The model is also highly flexible to accommodate ever-changing needs. Its upgradeability and plug-in modular capabilities allow users to add additional features and options as the need arises. WF 736 DUO is a reliable, powerful, and versatile equipment for wafer and mask inspection. With its advanced technologies and user-friendly interface, the system can quickly and accurately analyze and characterize samples for detailed, high-resolution results.
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