Used AMECON JANUS 200 / 300 #9193407 for sale

AMECON JANUS 200 / 300 is an advanced mask and wafer inspection equipment designed to achieve superior yield results. This system utilizes dedicated sensors with high sensitivity and resolution to detect any printed defects, allowing it to be utilized in both production and research and development environments. The combination of superior optics and detector sensitivity results in a defect detection rate of up to 10µm, ensuring that no defects are missed while still providing a fast inspection rate of more than 250 wafers per hour. The software used to operate the unit is easy to understand, allowing for quicker set-up and use on any process. The JANUS 200 / 300 features robust construction, which includes high-precision scanning stages for wafer alignment and positioning, high-precision X-Y stages for rapid pattern alignment, automatic exposure control, auto-focus, and adjustable laser power to ensure perfect alignment of the inspected area. Additionally, the machine is designed with a custom-designed miniaturized fiber-optics-based optical engine, which captures the full-dimensional image of each wafer with minimal engagement time. In addition to defect detection, the tool is also equipped with defect classifiers, allowing for quick and accurate sorting of detected defects into meaningful categories. This enables operators to quickly assess the causes of any defect, so that corrective action can be taken if necessary. The JANUS AMECON JANUS 200 / 300 also features a set of innovative technologies that make it ideal for production line use. These include its ability to work in extreme temperatures, its ability to register and remember several different patterns from different substrates, and its ability to easily switch between several selectable lenses. Furthermore, the asset's internal logic and memory can store information about up to 1000 wafer substrates and simultaneously detect multiple defects in a single scanned wafer, making it an invaluable asset to any production line. The combination of robust construction, improved optics, and advanced software yields a powerful mask and wafer inspection model that is capable of providing high-quality results with minimal cycle time. 200 / 300 is the perfect solution to any semiconductor manufacturing process, providing outstanding yield and reliable outcomes.