Used ASM IBE 139 #9069578 for sale

ASM IBE 139
Manufacturer
ASM
Model
IBE 139
ID: 9069578
Vintage: 2005
Systems 2005-2010 vintage.
ASM IBE 139 Mask & Wafer Inspection Equipment is a high-performance imaging system designed to perform real-time in-line inspection applications. ASM IBE139 builds on ASM expertise in defect detection and global metrology capabilities to accurately detect and measure flaws in critical non-standard mask features during in-line production. The unit is equipped with advanced imaging mapping and fault detection functions, including 6-sigma 3D cross-section views and parametric analysis, enabling the monitoring of key production parameters. The machine also features an integrated visual inspection tool, capable of detecting very small features such as microloading and multi-layer defects. IBE 139 has an array of specialized digital imaging sensors that quickly capture images of different aspect ratios and field of view to detect even the smallest of errors quickly and accurately, in reflection. The asset is also capable of measuring variations in an array of different materials and patterns that can be used, found, and analyzed. IBE139 Wafer Inspection Model is uniquely designed to allow fine control during the trial-and-error stages of shaping, ensuring that the issued products meet the desired design criteria. It uses advanced digital microscopy techniques to monitor each pass of mask processing, the equipment is able to detect masks and wafers that deviate from the desired design. The system is designed to accurately detect and measure minuscule defects, including, but not limited to, contamination, etch damage, uncontrolled gas concentrations, photomask defects, and contamination under the photomask or photoresist layer. The unit uses statistical process control techniques to measure non-standard mask features. The optics provides a white/clear light source for light-recording and laser light sources for shadow cancellation for a wide range of sample parts. ASM IBE 139 Wafer Inspection Machine also supports differential focus imaging (DFI), capable of detecting surface cleanliness and deformation. ASM IBE139 Mask & Wafer Inspection Tool is designed to provide operators with an easy and efficient way to inspect a variety of critical parts. With its user-friendly interface, high resolution imaging, and superior metrology capabilities, IBE 139 is among the best available for high-precision in-line inspection demands.
There are no reviews yet