Used ASM IBE 139 #9266246 for sale

ASM IBE 139 is a mask and wafer inspection equipment designed for the inspection of reticles and wafers used in Semiconductor manufacturing. It uses a sensitive, high-speed imaging scanning system designed to detect particle-level defects and non-uniformity issues in both conventional and extreme ultraviolet (EUV) mask and wafer images. The unit consists of two components: an inspection optics which houses the projection lens machine and the inspection software. The projection lens tool consists of a DUV lens, spacer lenses, and an imaging camera. The DUV lens is used to create a uniform and undistorted image of the pattern on the mask or wafer to be inspected. The spacer lenses are able to magnify and adjust the image to the scanning asset's field of view. The imaging camera captures the image and is able to detect particle-sized defects. The inspection software consists of several algorithmic modules, each designed to detect various types of defects and non-uniformity issues. These include calibration accuracy differences, line width, and defect detection. The software is automated and has the ability to detect defects in multiple mask levels. It also utilizes pattern-recognition technology that can detect small-scale particle-level defects. The software is designed to be user-friendly and includes reporting and data export capabilities. ASM IBE139 is an advanced inspection model. It is designed to detect particle-level defects in a wide range of mask and wafer applications. Its high-speed imaging scanning capabilities and automated detection algorithms provide an advanced solution for optimizing process efficiency and quality control. IBE 139 is an economical solution that provides an essential tool for semiconductor manufacturing.