Used ASM IBE 139 #9396619 for sale

ASM IBE 139 Mask and Wafer Inspection Equipment is an advanced tool designed to enable semiconductor manufacturers to quickly and accurately detect and identify defects in their products. The system's specialized optical and electron microscopy techniques allow for the observation of geometrical details on levels that are not visible to the naked eye, and a unique image-based defect identification task enables rapid automated detection of defects in photomasks and wafers. The unit is composed of two main components: the optical-imaging stage and the electron-imaging stage. The optical-imaging stage provides illumination, imaging, and detection capabilities using a digital camera. It is capable of magnifying optical features up to 1000x, allowing for the high-resolution imaging needed to identify defects. Additionally, the optical-imaging stage is equipped with a full color digital camera sensor with monochrome CCD capabilities. This enables the machine to capture images quickly and accurately in both color and monochrome. The electron-imaging stage is composed of an innovative Electron Beam Inspection Tool (EBIS) and a Scanning Electron Microscope (SEM) with associated components. The EBIS is used to capture defect images and generate micrographs for defect identification. It is equipped with an electron beam scanning (EBS) asset and a fully automated defect classification process. The model is capable of acquiring images from extremely small areas, measuring as small as a few nanometers, allowing for the accurate detection of even the smallest defects. The SEM, on the other hand, provides electron optical images with magnifications up to 50,000x. It is equipped with an automated defect recognition equipment capable of identifying a broad range of defects, from surface and subsurface features to line direction errors and open/short defects. Furthermore, ASM IBE139 Mask and Wafer Inspection System is also compatible with a range of data analysis software programs, such as the well-known ImageJ. This enables users to quickly and easily combine images from the optical and electron imaging stages and store them in a database for future access and analysis. ASM also provides an online database of common substrate materials and their corresponding optical parameters, making it easy for users to identify the appropriate settings for each sample. IBE 139 Mask and Wafer Inspection Unit is an efficient and reliable tool, designed to facilitate the detection and analysis of defects in semiconductor products. Its high resolution imaging capabilities and automated defect identification systems enable users to quickly and accurately identify and classify defects. Additionally, its compatibility with third-party software programs, along with its extensive substrate database, make it a valuable asset for any semiconductor manufacturer.