Used ASM ISIBE 139H #9396132 for sale

ASM ISIBE 139H is a high performance mask and wafer inspection equipment used in the semiconductor fabrication process. It's equipped with a large array of advanced imaging and inspection features that can detect defects down to 11 microns, making it ideal for inspecting tiny features on complex wafers, such as mask patterns and MEMS structures. ISIBE 139H has a high operation speed, allowing it to process wafers with high throughput. The system utilizes advanced laser imaging and inspection technology to provide extremely precise and accurate images of devices. Its efficient image processing algorithms ensure that only the most important features are captured and analyzed. It's also equipped with an advanced defect detection scheme that detects misaligned, missing, and thinned out patterns. The unit is capable of detecting even the most difficult to detect defects, making it suitable for applications such as atomic force microscopy (AFM) and electron-beam lithography (EBL). ASM ISIBE 139H also features a high accuracy focus control machine which helps to provide high-resolution images. The tool's 10 μm resolution imaging produces a larger inspection area than other systems, allowing it to detect more defects in a shorter amount of time. The asset is also equipped with automatic defect analysis and classification capabilities, giving it an edge over other inspection systems that require manual intervention for defect identification. ISIBE 139H has an intuitive user interface designed for easy operation and minimal training. Its advanced calibration model enables easy, accurate and consistent positioning of the wafers and mask patterns. The equipment also features an auto-focus capability that allows the user to quickly and accurately adjust the optical focus for better results. ASM ISIBE 139H is widely used in the semiconductor industry, providing reliable defect detection and defect identification capabilities. Its high performance, precision, and intuitive user interface make it the ideal choice for mask and wafer inspections. Its advanced imaging, defect detection, and calibration features ensure accurate and reliable results, making it an essential tool for any semiconductorfabrication process.