Used ASM ISISP-189 #9396588 for sale

ASM ISISP-189 is an automated mask and wafer inspection equipment designed for the semiconductor manufacturing process. It features a fully automated wafer handler and automated alignment for rapid setup times. ISISP-189 is equipped with a 630 nm laser light source, a high resolution monochrome camera, and an optics stage that can be aligned manually or automated with the included software. The system is capable of measuring and detecting defects in both masks and wafers up to 150 mm in diameter. When inspecting a mask or wafer, ASM ISISP-189 uses both brightfield and darkfield imaging to capture high-resolution images of all defects present. The unit is optimized for both thin film and patterned structures, allowing for the accurate detection of both hard and soft defects. ISISP-189 is also capable of identifying repeating structures such as "like-images", which can be used to quickly identify minor differences between the same replication across various wafers or even different production runs. The machine has excellent wafer measurement capabilities with an accuracy of less than 10 nm, making it ideal for use in advanced chip fabrication processes. ASM ISISP-189 has advanced filtering capabilities for enhanced defect detection and reporting. This includes sub-pixel filtering technologies which extract the maximum amount of information from each inspection. The tool also features different defect classification and reporting algorithms, allowing for the translation of defect location, intensity and shape into useful data for image analysis. ISISP-189 also comes equipped with a robust software suite that allows for advanced data analysis and image processing. This includes specific mask and wafer inspection tools, advanced image processing, automated defect extraction, image reconstruction and filtering, and full engineering reports. The software also allows for easy integration with other automated systems used in the production process. Overall, ASM ISISP-189 is a powerful and reliable automated mask and wafer inspection asset. It features advanced imaging and defect detection capabilities, highly accurate wafer measurement and excellent filtering technologies. With its robust software suite, the model is well-suited for both research and industrial applications.