Used ASML / HMI EP3 #293615134 for sale

ASML / HMI EP3 is a mask and wafer inspection equipment designed to provide high-resolution imaging and critical inspection capabilities to semiconductor fabs. The system comprises of an electro-optical column integrated with a state-of-the-art field-emission electron source and a solid-state imaging column. The multi-zone optical unit is equipped with laser-light source and demagnification optics, providing a large field of view with extended depth of focus. A multi-angle imaging technique is employed to reduce the distortion while maintaining a high magnification. The Multi-Beam Electron Scanning Head contain a secondary electron detector and a centered field-emission electron source, capable of producing a beams with variable accelerating voltages up to 100kV. The beams are capable of producing high contrast imaging with crystal structures present in the specimens. The imaging module is integrated with a wide range of control and data acquisition electronics. The software module of the unit provides an intuitive and operator friendly graphical user interface with long-term data storage and retrieval capabilities. The inspections results can be integrated in the process control machine for precision control of mask and wafer manufacturing process. HMI EP3 also allows for customization to individual factory requirements by providing user-defined inspection areas, detailed error tables and programmable data storage and retrieval functions. Furthermore, the tool is reliable, efficient and accurate in achieving precise results within the specified testing parameters. The asset allows the user to control multiple views of the same specimen, enabling better resolution and image quality. The multi-beam operations increases the scanning times and the beam control enables precise detail in polygon levels. Furthermore, the mask and wafer imaging software allows the operator to define inspection zones, monitor them across multiple layers, and isolate any errors encountered during the imaging process. In conclusion, ASML EP3 is an advanced mask and wafer inspection model designed to provide reliable and efficient performance with high-resolution imaging and critical inspection capabilities. The equipment is customizable to individual factory requirements and enables precise error monitoring and data retrieval. The multi-zone optical imaging, multi-beam electron scanning head, and the user-friendly software interface make the system the perfect choice for production process control and inspection in the semiconductor industry.