Used CARL ZEISS AIMS 193 #9196378 for sale

CARL ZEISS AIMS 193 is a mask & wafer inspection equipment designed for wafer patterning and defect management. It is an advanced imaging system that provides sub-micron resolution images of patterns on semiconductor mask and wafers. The imaging unit captures digital images of the surface of the mask/wafer and follows its development process. AIMS 193 is equipped with multiple devices such as a spectrograph, microscope, and slit. With these components, it is capable of providing superior image resolution of 0.1 - 0.2 um with a maximum field of view of 512x8192. In addition to the imaging hardware, the machine is also equipped with software that enables users to manage and analyze image data. The software includes a traceback tool that allows users to track changes values and has advanced imaging analysis capabilities. It allows for the review of fabrication and alignment processes in real-time. Moreover, the software offers a variety of options for imaging manipulation, including contrast adjustment, aspect ratio adjustment, sharpness adjustment, slicing, and object extraction. The asset also has a touch-screen monitor for efficient navigation and setup. It provides functions such as 'zoom,' 'pan,' 'rotate', 'reverse', 'hue', 'saturation', 'rotation', 'label', and image 'editing'. Furthermore, the device can also capture high resolution digital images of metalization features and defects. The software can then be used to analyze the images to verify various kinds of test results, 3D model generation, tolerancing and translations. CARL ZEISS AIMS 193 is an advanced inspection model designed to detect and monitor defects on semiconductor masks and wafers. This equipment provides superior imaging capabilities of sub-micron resolutions, along with tools for analysis and manipulation. With its combination of hardware and software, AIMS 193 is an effective system for defect management, visualization and manufacture processes.