Used CARL ZEISS AIMS 248 #9251826 for sale

CARL ZEISS AIMS 248 is an automated inspection equipment for mask and wafer inspection that incorporates revolutionary imaging technology to provide state-of-the-art precision and accuracy in the review and evaluation of mask and wafer surfaces. This inspection system features a unique telecentric optics platform that provides superior imaging quality while utilizing less than 1% of the optical power and time compared to traditional optics systems. The unit also incorporates a high resolution color CCD camera, which is capable of capturing images with an enhanced depth of field and unmatched level of image clarity. To further optimize the inspection process, AIMS 248 contains an automated focus adjustment machine that can identify and correct any focus drift and introduce pinpoint accuracy to image reviews. This feature greatly reduces the time frame required to complete an inspection process and allows data to be interpreted more quickly than ever before. Furthermore, the tool offers several support features including integrated computer-controlled wafer and mask position sensors for detecting defects and positional accuracy up to 0.0001cm, dynamic scan speed adjustment, and intuitive data analysis tools. CARL ZEISS AIMS 248 utilizes a revolutionary microscopy technique called optical profilometry, which enables it to measure thin film surface profiles, shapes, and other surface defects with extreme accuracy. This advanced asset can detect and analyze surface imperfections and defects with a resolution of less than 50 nm. To further enhance its capabilities, the model features a wide variety of accessories such as a laser based particle counter for measurement of thin film particle positions, a high resolution microscopy attachment for detailed analysis of surface defects, a scatterometer for measurement of surface reflectivity, and a variable angle of incidence attachment for precise measurement of surface properties. These features have made AIMS 248 a superior tool for mask and wafer inspection. This equipment offers remarkable imaging performance, enhanced accuracy, and maximum ease of use. With a wide range of accessories and customizable imaging parameters, CARL ZEISS AIMS 248 is capable of meeting any inspection requirement for high-end mask and wafer inspection processes.