Used CARL ZEISS AIMS 32-193i #9254199 for sale
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ID: 9254199
Photomask repair system
For stepper, 193 nm
LITO Grade optics
VIS Microscope
Illumination unit
Interferometer stage
ArF Industrial grade
Excimer laser
Wavelength 193.4 nm
Sigma aperture slider: ~100 Sigma apertures
SMIF, 8"
Handler system
TUILASER ExciStar S-Industrial Laser
Excimer (Argon fluoride)
Wavelength: 193 nm
Embedded laser class IV
Laser class I
Pulsed
Wafer equivalent NA: >1
Numerical aperture range: 0.9 - 1.4 scanner NA
Sigma range: 0.3 - 0.98
Illumination type: circular and off axis
Linear polarization capability
Vector effect emulation capability
Through pellicle capability
Reticle: 6"/250 mil with/without soft pellicle
Stepper reduction: 1:4
Measurement field: 10 x 10μm
Power supply: 400V
2010 vintage.
CARL ZEISS AIMS 32-193i is an advanced mask and wafer inspection equipment that is used in semiconductor production. This system is designed to help manufacturers identify and address potential problems within their lithography process. The inspection unit is built on a 33" x 33" stage with a telecentric optical machine that provides a clear and repeatable image. It has an LED illuminator with spectral lighting that helps to reduce glare and improve contrast. The tool features a 193nm aperture and high NA optics, along with an 8 megapixel camera for high resolution images. It has an automated vision asset that allows for rapid cycle times and is capable of high speed pattern defect inspection. AIMS 32-193i is equipped with an intuitive user interface that allows easy access to model features such as automated focus, pattern matching, and line scan inspection. It is designed for high levels of accuracy and repeatability, with an error rate of less than 1%. This equipment is also equipped with advanced image processing capabilities to detect the smallest imperfections and ensure defect-free wafers. The system is equipped with a broad range of analysis tools, such as a comprehensive set of metrology functions. The metrology tools provide information on pattern size and shape, as well as overlay and process uniformity. The unit can also measure distances between objects on the wafer with high precision. Overall, CARL ZEISS AIMS 32-193i is a reliable and powerful inspection machine that is designed to help semiconductor manufacturers improve their lithography process and ensure defect-free wafers. It is capable of high speed pattern inspection, and features an intuitive user interface for easy access to tool features. It is also equipped with a robust set of metrology tools that provide detailed analysis of patterns, overlays, and process uniformity. This asset is essential in helping semiconductor companies produce high quality wafers and ensure their products meet strict industry standards.
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