Used CARL ZEISS AIMS 32 #9293596 for sale

CARL ZEISS AIMS 32 is an advanced mask and wafer inspection equipment that combines high resolution imaging with advanced proprietary algorithms. This innovative system from one of the world's leading producers of microscopes and scientific imaging systems is ideal for all types of substrates including photomasks, glass, ceramics and wafers. AIMS 32 is designed to provide faster and more accurate defect detection than other inspection systems currently on the market. At the heart of CARL ZEISS AIMS 32 is CARL ZEISS OptiChrome multi-layer lens unit. This machine uses a combination of broadband achromatic optics and high-resolution imaging to capture key characteristics of each sample. A variable shape pattern recognition algorithm is used to analyze the structure of the sample and detect any anomalies. Once the image is captured, the tool can instantly identify defects such as contaminates, process flaws and other imperfections. AIMS 32 also includes advanced features to streamline the inspection process and improve the accuracy of results. The asset is designed to be easy to operate and can be quickly calibrated to accommodate different sample sizes. The full-featured software features on-screen "wizard" helpers and automated module control, and can store up to 100,000 image sets for easy recall or comparison. The model also includes sophisticated metrology capabilities designed to accurately measure and record a variety of features, including line edge roughness, line widths, contact holes, and defect topography. This allows users to quickly detect potential production problems and modify their processes to improve efficiency. CARL ZEISS AIMS 32 is compatible with most common industry-standard substrates and integrates seamlessly into existing production systems. Its highly precise imaging equipment and modular design make it perfect for any application, including photomask and wafer mapping, process development and monitoring, and product quality control. AIMS 32 mask and wafer inspection system is an innovative solution designed to improve yield, reduce costs and maximize product quality in the semiconductor industry. Its exceptional imaging capabilities and automated data analysis capabilities make it the perfect choice for any mask or wafer inspection unit.