Used CARL ZEISS / HSEB Axiospect 300 #9397355 for sale

CARL ZEISS / HSEB Axiospect 300 is an advanced automated mask and wafer inspection equipment used for high-resolution imaging, measurement and analysis of semiconductor devices. It features a unique combination of multi-reflection optics and high-performance sensors, which allows for detailed and accurate inspection of the intricate patterns that make up masks and wafers. The system contains an integrated optical-transport-unit with a high numerical aperture (NA) of 0.5, with a modular zoom that can be used to accommodate wafers of various sizes. HSEB offers a field of view that can vary from 0.2 mm to 1.2 mm and is capable of capturing and measuring the smallest structures down to 0.5 μm. It is able to image in both brightfield and darkfield imaging mode, and is equipped with an automated stage for multi-site scanning. The imaging subsystem of CARL ZEISS employs a high-resolution CCD camera that captures images with a dynamic range of 12 bits. It has a sophisticated light source composed of a flat fluorescent illuminator, a monochromator, and an integrated laser diode. This light source is used to create multi-channel images, as well as multi-wavelength imaging with four different excitation wavelengths. The machine offers a variety of image-processing tools, including Fourier transform, binary filters, morphology filters, and image-segmentation. These features make it easy to differentiate features such as particle defects, lines, or even obstructed images, including defects within a single layer on the wafer or even defects between two layers. CARL ZEISS / HSEB also offers a wide range of flexible measurement options, such as line-width measurements, overlay calculations, or evaluation of aspect ratios. It is also equipped with an automated defect classifier and a review station, which streamlines the inspection process. Finally, an integrated database allows for results to be automatically stored for future analysis. Overall, HSEB Axiospect 300 is an advanced and versatile mask and wafer inspection tool that offers a combination of high-resolution imaging, measurements and sophisticated image analysis; ideal for semiconductor device inspection, research and development.