Used CARLO ERBA 1500 #86211 for sale

CARLO ERBA 1500 is an advanced inspection equipment designed specifically for detecting mask and wafer defects. This system combines advanced imaging, automated input and manual verification processes to ensure that all detected defects are accurately identified and reported. The imaging technology employed in 1500 makes it possible to detect minuscule defects on the mask and wafer surfaces. It uses a special optical microscope equipped with sub-micron resolution to magnify and image marked defects on the die surface, enabling easy identification and measurement. A high-resolution charge-coupled device (CCD) camera is used to capture the images and to record their measurements. The unit also comes with automated fault detection algorithms to assist in this process. These algorithms are programmed to accurately determine the size and shape of any defect(s) specified in the inspection program. The software can also determine if a defect is a result of a variable process related defect or a mask/wafer issue. Additionally, CARLO ERBA 1500 provides a manual input process, allowing a user to manually review detected defects. With this feature, users can check the size, shape, location and nature of the detected defect and make corrections or provide additional information. Finally, 1500 also includes a powerful reporting feature, allowing the user to generate a comprehensive report that includes any detected defect measurements and its respective nature. This feature is aimed to help manufacturers make informed decision on the acceptance/reject criteria of their masks/wafers. Overall, CARLO ERBA 1500 is an advanced inspection machine specifically designed for detailed inspection of masks and wafers. This tool combines advanced optical microscopy, automated image input, automated defect detection algorithms and manual input to ensure that all detected defects are accurately identified and reported. By providing superior imaging, fault detection and reporting capability, 1500 is considered to be one of the top mask and wafer inspection systems currently available.