Used CEI Opt 653 #149295 for sale
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ID: 149295
Third optical inspection machine with auto conversion
Package specification:
Lead frame dimensions:
Width: 20 mm - 90 mm
Length: 140 mm - 280 mm
Loading / unloading:
Single magazine input / output
Magazine Dimensions:
145 mm to 285 mm (Length)
25 mm to 95 mm (Width)
150 maximum (Height)
Convertible magazine elevator system (programmable pitch)
Motorized Frame pusher assembly with obstruction sensors
Auto package conversion sensor controls to prevent damages to parts
Workholder station:
High accuracy Programmable X-Y table
Device obstruction detector
Pneumatic device gripper to inspection area
Less than 5 minutes programming time (for pre-programmed package)
X-Y index accuracy of ± 50um
Manual and auto indexing capability
Inspection System:
Segmented inspection (up to 16)
Option of performing sampling or 100% inspection
Stereozoom microscope
Strip mapping features with defect codes
Software features:
100 Predefine reject coding
GPPH, MTBA, MTTA report and SPC
Lot report with strip map
Reverse strip report useful for QA
5 Stage password protection
Premapping software features
Programmable strip movement during inspection
Strip map color coding
Segmented inspection (up to 16 segment)
Controller:
Microsoft Windows PC based control with UPS
Facilities:
Power supply: 110 VAC / 8 A, 230 VAC / 4A
Air supply: 72.5 psi (5 bar), CDA.
CEI Opt 653 is a mask and wafer inspection equipment designed to detect defects and contamination on mask and wafer substrates. Developed by California Eastern Laboratories, Opt 653 features automated inspection and improved image quality via its 3-2-infinity optics and new mask inspection algorithm. The system offers excellent surface finish for flawless image quality and the highest possible defect resolution. The unit can detect sub-micron defects and surface contamination on both opaque and transparent mask substrates. It uses an optical character recognition algorithm to detect even the finest details and irregularities on the surface of the wafer and mask. The machine is optimized for various image processing algorithms, such as ridge-line feature localization and edge enhancement. The hardware of CEI Opt 653 consists of five main components - a multi-channel high-resolution camera, a zoom lens, and a beam-splitting mirror; three fixed-size stage positions; and a field-effect transistor (FET) detector array. The zoom lens allows the tool to rapidly focus on a specific defect or object with absolute accuracy. The FET detector array increases the resolution of the camera, allowing for very small defects to be detected. Opt 653 is software-enabled and features pre-set inspection and process recipes, which allows the user to quickly set up and run a scan or inspection. It also has an intuitive user interface that allows the user to adjust operations and settings as needed. The asset also provides complete control of the illumination, focusing and magnification settings, as well as the capability to initiate and stop the inspection process. For higher-precision and more accurate results, the user can select from three inspection modes: Planar, Contact and Overscan. CEI Opt 653 is compatible with the company's OnDemand platform, which enables data capture and reporting, as well as remote viewing and analysis. The platform also allows users to recall previous scans and inspections, archive results, and record trends. The model is available with a 47.2" table size, and is capable of handling both circular and square mask substrates. It is also designed to be user-friendly and offers a fast, accurate and reliable solution for mask and wafer inspection.
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