Used DATAPHYSICS ACA 50 #9123550 for sale

DATAPHYSICS ACA 50 is a powerful mask and wafer inspection equipment designed for use in semiconductor fabs. It provides accurate defect and topography measurements of wafer-based defects and contamination. It is capable of detecting sub-wavelength defects as small as 0.07µm, enabling high-resolution imaging and analysis. The system features a patent-pending adaptive contrast technology, which modulates the brightness and contrast of the image for better inspection results. This is important when inspecting process-sensitive defects and contamination and is especially useful for devices with complex layouts. The unit uses an infrared light source, which is accurate and safe. It also features an advanced multispectral imaging analysis machine, which enables simultaneous acquisition of image data with multiple filters. This ensures accurate and repeatable results, even with different sample types and substrates. ACA 50 has a user-friendly user interface that makes it easy to set-up and operate. It also includes a variety of advanced features to enhance the efficiency and accuracy of inspection tasks, including automated wafer registration, background compensation, defect scaling, image stitching, image optimization, and stage alignment. The tool features an integrated stage for automated sample handling. It is equipped with a motorized X-Y mechanical stage and supports a maximum sample size of 6"x6". The stage is equipped with proprietary technology to ensure precise positioning and alignment of the sample for efficient inspection. The asset is integrated with a library of custom-developed software tools to help reduce inspection time and enhance accuracy. These tools include a defect tracker tool, an image pre-processing module, and a wafer-level analysis module. It also includes a GUI-based defect grading model and an integrated defect analysis database that stores and organizes all inspection data. DATAPHYSICS ACA 50 is designed to deliver a fast, accurate, and repeatable automatic wafer and mask inspection process. By providing users with comprehensive analysis capabilities and efficient automation, the equipment helps reduce overall costs and improve yield.