Used DATAPHYSICS OCA 40 #293607248 for sale

DATAPHYSICS OCA 40 Mask & Wafer Inspection Equipment is designed for precise metrology of both masks and wafers. It offers high-resolution imaging with data capture and analysis of surface features for quality control in semiconductor manufacturing. The system consists of a motion and control subsystem comprised of a through-the-lens, laser based, 3D positional and dimensional metrology, a precision motorized zoom unit, and with trans-"Z" controls and air bearing stages, high speed inspection movements. The optics subsystem features integrated video capture, data acquisition, and analysis capabilities, along with the use of high dynamical range illumination. The imaging machine is equipped with a variety of lenses that facilitate low-to-high magnification ratio, allowing for a wide range of imaging parameters, including field of view, sampling distance, pixel resolution, and spectral range. The on board analysis tool provides data analysis capabilities such as Automatic Defect Detection and Recognition (ADF-R), finite element modeling, automatic profile tracing pixel count, area measurement and correlation, and 3D coordinate based registration. The asset also features automated measurement tools such as eyeglass and mask layers metrology. The model is designed to provide fast, precise and repeatable measurements, enabling faster reviews and more accurate quality assurance and yield decisions for wafer manufacturers. It is highly flexible, and provides users with the ability to customized parameters and utilize multiple recording formats for data collection. OCA 40 supports a wide range of image analysis algorithms and useful pattern recognition capabilities, allowing users the capability to identify potential defects and reduce the need to manually inspect a large number of masks and wafers. The equipment is offered in a portable form factor and can be synchronized with other production equipment. Overall, DATAPHYSICS OCA 40 Mask & Wafer Inspection System provides efficient, highly accurate, and repeatable measurements, capabilities and features for mask and wafer inspection and inspection verification, making it an ideal tool for quality and production control in the semiconductor manufacturing industry.