Used ESI / MICROVISION MV 853 #9104086 for sale

ESI / MICROVISION MV 853 mask & wafer inspection equipment is an accelerator driven, comprehensive inspection and metrology tool for highly precise measurements of photomasks and wafers. Combining the leading performance of ESI MV family with superior particle dynamics, the system provides a complete solution to the requirements of sophisticated mask & wafer inspection systems for the semiconductor industry. ESI MV 853 is a fully automated unit that is capable of both inspecting and measuring of a wide variety of mask and wafer geometries with unprecedented speed and accuracy. It offers the highest resolution imaging available today and is equipped with several precise measurement tools such as Layout Comparison (LQV), Overlay Measurement (OVM), Spectral Reflectivity and Wavelength Dependent Measurement (WMD), as well as a reliable Defect Detection Module (DDM) for locating macro defects on the line edges, as well as patterned, blocked, and unknown defects. The machine's proprietary high throughput data acquisition technology takes advantage of cutting-edge accelerators and mirrors for excellent speed and throughput. It offers a dynamic range of up to 60dB and measures feature sizes down to 5.1nm in DIWNAE (Deep Isolated Wide Noise and Edge Effect) mode. In addition, the augmented signal capability allows the tool to better distinguish between defects and non-defects while providing higher measurement accuracy and detection accuracy. Other features of MICROVISION MV 853 include Auto Focus, Pattern Shooting, Field of View Finder, Intermediate Focus, Dynamic Focus, and Resolution Range Extender. The Auto Focus feature automatically guides the user to the optimal focus setting based on wafer/mask depth. The Pattern Shooting feature captures images of pre-defined patterns or rectangular regions of interest on the mask. The Field of View Finder (FOVF) allows users to acquire multiple images in various orientations and magnifications. The Intermediate Focus feature quickly scans the entire wafer to find the optimal focus settings. Dynamic Focus can be used to quickly find the optimal focus settings for areas or areas of interest. Lastly, the Resolution Range Extender permits users to measure minor features that are not possible with diffraction limited optics. MV 853 is a comprehensive mask & wafer inspection asset designed to deliver highly precise measurements with optimum throughput and accuracy for a wide array of mask or wafer geometries. This model offers the best in class imaging resolution, dynamic range, enhanced signal capability, and several other precise metrology tools to satisfy the demands of the most complex mask & wafer inspection equipment requirements.